- Software for Device Modeling
- Software for Chemical Vapour Deposition
- Software for Bulk Crystal Growth
Software for Modeling of Chemical Vapor Deposition
CVDSim, software tool for modeling of epitaxy, including Metal-Organic Vapor Phase Epitaxy of GaN-, InN- and AlN-based materials (III-nitride MOCVD), Metal-Organic Vapor Phase Epitaxy of arsenides and phosphides (III/V MOCVD), GaN growth by Hydride Vapor Phase Epitaxy (III-nitride HVPE), silicon carbide epitaxy, silicon epitaxy
HEpiGaNS (Hydride Epitaxial GaN Simulator) is the software tool designed for modeling of GaN crystal growth by hydride vapor phase epitaxy (HVPE) using advanced models of surface kinetics important for adequate predictions of the growth
Software for Modeling of Bulk Crystal Growth
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ViR
(Virtual Reactor) is
the software package designed as a computer simulator of long-term
growth of bulk SiC and AlN crystals by sublimation
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- SiLENSe (Simulator of Light Emitters based on Nitride Semiconductors) is the simulator of Light Emitters based on III-nitrides, II-oxides, and hybrid MgZnO/AlGaN heterostructures
- SpeCLED (Spreading of Current in Light Emitting Diodes) is the package for 3D modeling of current spreading and temperature distribution in LED chips
- RATRO (RAy-TRacing SimulatOr of Light Propagation) is the software tool for 3D modeling of light extraction from LED chips.
BESST (Bandgap Engineering Superlattice Simulation Tool) is the package for simulation of optoelectronic devices based on group-III nitride superlattices
SELES (Segregation Effect on Light Emission Spectrum) is the package for analysis of unsteady surface segregation occurring in in III-nitride heterostructure growth by MOCVD, combined with express analysis of luminescence properties of LED-like structures
FETIS (Field Effect Transistor Integrated Simulator) is the simulator of band diagrams and characteristics of III-nitride FETs


